In order to achieve low processing temperature and efficient coatings deposition for manufacturing applications, a novel torch has been developed that couples in a double DBD design high frequency (HF ~17 kHz) and radio frequency (RF ~27 MHz) excitations. The design allows to obtain a stable RF plasma also in reactive processes and with the possibility to control on the treated substrates ions flux and surface charging, avoiding the micro-discharges. The plasma has been electrically and optically characterized by emission spectroscopy.

A novel plasma jet with RF and HF coupled electrodes

M. Mardegan;E. Cattaruzza
2019-01-01

Abstract

In order to achieve low processing temperature and efficient coatings deposition for manufacturing applications, a novel torch has been developed that couples in a double DBD design high frequency (HF ~17 kHz) and radio frequency (RF ~27 MHz) excitations. The design allows to obtain a stable RF plasma also in reactive processes and with the possibility to control on the treated substrates ions flux and surface charging, avoiding the micro-discharges. The plasma has been electrically and optically characterized by emission spectroscopy.
ISPC 24 Proceedings
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10278/5010223
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