In order to achieve low processing temperature and efficient coatings deposition for manufacturing applications, a novel torch has been developed that couples in a double DBD design high frequency (HF ~17 kHz) and radio frequency (RF ~27 MHz) excitations. The design allows to obtain a stable RF plasma also in reactive processes and with the possibility to control on the treated substrates ions flux and surface charging, avoiding the micro-discharges. The plasma has been electrically and optically characterized by emission spectroscopy.
A novel plasma jet with RF and HF coupled electrodes
M. Mardegan;E. Cattaruzza
2019-01-01
Abstract
In order to achieve low processing temperature and efficient coatings deposition for manufacturing applications, a novel torch has been developed that couples in a double DBD design high frequency (HF ~17 kHz) and radio frequency (RF ~27 MHz) excitations. The design allows to obtain a stable RF plasma also in reactive processes and with the possibility to control on the treated substrates ions flux and surface charging, avoiding the micro-discharges. The plasma has been electrically and optically characterized by emission spectroscopy.File in questo prodotto:
File | Dimensione | Formato | |
---|---|---|---|
A novel plasma jet with RF and HF coupled electrodes_ISPC Conference.pdf
accesso aperto
Tipologia:
Versione dell'editore
Licenza:
Accesso gratuito (solo visione)
Dimensione
719.89 kB
Formato
Adobe PDF
|
719.89 kB | Adobe PDF | Visualizza/Apri |
I documenti in ARCA sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.