A relevant increase in the electroanalytical application of submicrometer sized electrodes came with the development of arrays of nanoelectrodes. In the nanoelectrode ensembles (NEEs), the spatial distribution of the nanoelectrodes is random, while in the nanoelectrode arrays (NEAs) it is ordered. NEAs are typically fabricated by top-down microfabrication techniques, such as electron-beam lithography or nano-imprinting, while bottom-up technologies, such as the template methods and self-assembly are more often used for NEEs. NEEs/NEAs can exhibit three distinct response regimes depending on the scan rate or distance between the nanoelectrode elements: Total Overlap, Pure Radial and Linear Active. In the present work, NEAs are prepared by e-beam lithography and used for voltammetric measurements.
|Data di pubblicazione:||2010|
|Titolo:||Arrays of nanoelectrodes. Critical evaluation of geometrical and diffusion characteristics with respect to electroanalyitcal applications..|
|Digital Object Identifier (DOI):||http://dx.doi.org/10.1149/1.3309675|
|Appare nelle tipologie:||2.1 Articolo su rivista |
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