By radiofrequency magnetron sputtering co-deposition we synthesized Er:SiO2 film 0.5 μm thick on silica substrates, with Er content b0.3 atomic %. By changing the preparation condition (during deposition we have used an additional negative bias voltage applied to the substrates for inducing a low-energy ion bombardment, with or without a contemporary heating) and by varying the thermal treatment after the synthesis (the best conditions were 1 h in the range 700–800 °C, in air) we have obtained an Er:SiO2 system with an intense photoluminescence emission at λ=1.54 μm. The best-performing Er:SiO2 samples obtained by sputtering have shown a photoluminescence response comparable to that of the typical Er:SiO2 thin film systems obtained by conventional techniques used in applicative framework.

Photoluminescence optimization of Er-doped SiO2 films synthesized by radiofrequency magnetron sputtering with energetic treatments during and after deposition

CATTARUZZA, Elti;BATTAGLIN, Giancarlo;TRAVE, Enrico;
2011-01-01

Abstract

By radiofrequency magnetron sputtering co-deposition we synthesized Er:SiO2 film 0.5 μm thick on silica substrates, with Er content b0.3 atomic %. By changing the preparation condition (during deposition we have used an additional negative bias voltage applied to the substrates for inducing a low-energy ion bombardment, with or without a contemporary heating) and by varying the thermal treatment after the synthesis (the best conditions were 1 h in the range 700–800 °C, in air) we have obtained an Er:SiO2 system with an intense photoluminescence emission at λ=1.54 μm. The best-performing Er:SiO2 samples obtained by sputtering have shown a photoluminescence response comparable to that of the typical Er:SiO2 thin film systems obtained by conventional techniques used in applicative framework.
2011
519
File in questo prodotto:
File Dimensione Formato  
TSF519(2011)5376.pdf

non disponibili

Tipologia: Documento in Post-print
Licenza: Accesso chiuso-personale
Dimensione 380.44 kB
Formato Adobe PDF
380.44 kB Adobe PDF   Visualizza/Apri

I documenti in ARCA sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10278/30320
Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus 6
  • ???jsp.display-item.citation.isi??? 6
social impact